Title: Experience with deep UV excimer laser lithography
Abstract: Excimer laser lithography is rapidly emerging as the technology that will extend photolithography into the deep uv and enable linewidths as small as 0.5μm to be produced routinely. This paper describes the theoretical and experimental performance of a 1:1 Wynne-Dyson Projection lens designed to operate at a wavelength of 249nm and the development of a compatible resist technology.
Publication Year: 1987
Publication Date: 1987-12-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 2
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