Title: The Emergence of Alternative Developers for Extreme Ultraviolet Lithography
Abstract: Recent work on extreme ultraviolet (EUV) resists has shown the application of alternative resist processes as a possible solution to achieve lithographic performance targets. In this study, the potential of tetrabutylammonium hydroxide (TBAH) as a possible alternative to the currently used tetramethylammonium hydroxide developer solution was investigated. A significant improvement in lithographic performance was achieved using the TBAH developer. However, this developer solution has a relatively high freezing temperature, particularly at high concentrations. We report that the addition of glycerin to the TBAH developer lowered the freezing temperature without adversely affecting lithographic performance.
Publication Year: 2010
Publication Date: 2010-08-20
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 8
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