Title: Ultrathin Diblock Copolymer/Titanium Laminates—A Tool for Nanolithography
Abstract: Advanced MaterialsVolume 10, Issue 11 p. 849-852 Communication Ultrathin Diblock Copolymer/Titanium Laminates—A Tool for Nanolithography Joachim P. Spatz, Joachim P. SpatzSearch for more papers by this authorPeter Eibeck, Peter Eibeck Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorStefan Mößmer, Stefan Mößmer Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorMartin Möller, Martin Möller Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorThomas Herzog, Thomas Herzog Abteilung Festkörperphysik, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorPaul Ziemann, Paul Ziemann Abteilung Festkörperphysik, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this author Joachim P. Spatz, Joachim P. SpatzSearch for more papers by this authorPeter Eibeck, Peter Eibeck Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorStefan Mößmer, Stefan Mößmer Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorMartin Möller, Martin Möller Organische Chemie III–Makromolekulare Chemie, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorThomas Herzog, Thomas Herzog Abteilung Festkörperphysik, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this authorPaul Ziemann, Paul Ziemann Abteilung Festkörperphysik, Universität Ulm, D-89081 Ulm (Germany)Search for more papers by this author First published: 26 January 1999 https://doi.org/10.1002/(SICI)1521-4095(199808)10:11<849::AID-ADMA849>3.0.CO;2-5Citations: 62AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat Abstract A self-assembled diblock copolymer mask teamed with conventional ion etching is one approach to nanometer patterning of surfaces. An ultrathin film of polystyrene-block-poly(2-vinylpyridine) on mica is shown to yield isolated, regularly arranged clusters of polystyrene surrounded by a thin layer of poly(2-vinylpyridine)—see Figure. Subsequent selective deposition of a metal film followed by etching results in surface patterning. References 1 I. Brodie, J. J. Muray, The Physics of Micro/Nano-Fabrication, Plenum Press, New York 1992. 10.1007/978-1-4757-6775-9 Google Scholar 2 P. G. Collins, A. Zettl, H. Bando, A. Thess, R. E. Smalley, Science 1997, 278, 100. 10.1126/science.278.5335.100 CASWeb of Science®Google Scholar 3 D. H. Pearson, R. J. Tonucci, Adv. Mater. 1996, 8, 1031. 10.1002/adma.19960081222 CASWeb of Science®Google Scholar 4 C. A. Mirkin, R. L. Letsinger, R. C. Mucic, J. J. 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Publication Year: 1998
Publication Date: 1998-08-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 66
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