Title: Fabrication Technique of High Density Quantum-Wire Arrays by Photolithography and Metalorganic Chemical Vapor Deposition
Abstract: We have fabricated GaAs quantum-wire arrays by using photolithography and metalorganic chemical vapor deposition (MOCVD). Multiple quantum-wire structures with lateral dimensions less than 200 Å×1200 Å have been obtained. An area filling factor greater than 50% can be achieved.
Publication Year: 1991
Publication Date: 1991-12-01
Language: en
Type: article
Indexed In: ['crossref']
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