Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer‐Scale Spacings Created by Molecular Rulers

Name: Work Video:
Duration: 3 min 30 s
Description: A hybrid approach to nanolithography combines conventional lithography with chemical self-assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self-assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.
M. E. Anderson; Morgan Mihok; Hirofumi Tanaka; Lim-Piu Tan; Mark W. Horn; Gregory S. McCarty; Paul S. Weiss
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