Publication Information

{'id': 'https://openalex.org/W1980323190', 'doi': 'https://doi.org/10.1117/12.473505', 'title': 'Defect analysis in 157-nm photolithography process', 'display_name': 'Defect analysis in 157-nm photolithography process', 'publication_year': 2002, 'publication_date': '2002-07-01', 'ids': {'openalex': 'https://openalex.org/W1980323190', 'doi': 'https://doi.org/10.1117/12.473505', 'mag': '1980323190'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1117/12.473505', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S183492911', 'display_name': 'Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE', 'issn_l': '0277-786X', 'issn': ['0277-786X', '1996-756X'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'proceedings-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5011122605', 'display_name': 'Yukio Kiba', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I114132059', 'display_name': 'Tokyo Electron (Japan)', 'ror': 'https://ror.org/05gd76j39', 'country_code': 'JP', 'type': 'company', 'lineage': ['https://openalex.org/I114132059']}], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Yukio Kiba', 'raw_affiliation_strings': ['Tokyo Electron Kyushu Ltd. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Tokyo Electron Kyushu Ltd. (Japan)', 'institution_ids': ['https://openalex.org/I114132059']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5074298641', 'display_name': 'Shinya Hori', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I114132059', 'display_name': 'Tokyo Electron (Japan)', 'ror': 'https://ror.org/05gd76j39', 'country_code': 'JP', 'type': 'company', 'lineage': ['https://openalex.org/I114132059']}], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Shinya Hori', 'raw_affiliation_strings': ['Tokyo Electron Kyushu Ltd. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Tokyo Electron Kyushu Ltd. (Japan)', 'institution_ids': ['https://openalex.org/I114132059']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5049873746', 'display_name': 'Osamu Miyahara', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I114132059', 'display_name': 'Tokyo Electron (Japan)', 'ror': 'https://ror.org/05gd76j39', 'country_code': 'JP', 'type': 'company', 'lineage': ['https://openalex.org/I114132059']}], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Osamu Miyahara', 'raw_affiliation_strings': ['Tokyo Electron Kyushu Ltd. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Tokyo Electron Kyushu Ltd. (Japan)', 'institution_ids': ['https://openalex.org/I114132059']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5058562228', 'display_name': 'Yuko Ono', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I114132059', 'display_name': 'Tokyo Electron (Japan)', 'ror': 'https://ror.org/05gd76j39', 'country_code': 'JP', 'type': 'company', 'lineage': ['https://openalex.org/I114132059']}], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Yuko Ono', 'raw_affiliation_strings': ['Tokyo Electron Ltd. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Tokyo Electron Ltd. (Japan)', 'institution_ids': ['https://openalex.org/I114132059']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5062532037', 'display_name': 'Junichi Kitano', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I114132059', 'display_name': 'Tokyo Electron (Japan)', 'ror': 'https://ror.org/05gd76j39', 'country_code': 'JP', 'type': 'company', 'lineage': ['https://openalex.org/I114132059']}], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Junichi Kitano', 'raw_affiliation_strings': ['Tokyo Electron Ltd. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Tokyo Electron Ltd. (Japan)', 'institution_ids': ['https://openalex.org/I114132059']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5111995081', 'display_name': 'Seiro Miyoshi', 'orcid': None}, 'institutions': [], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Seiro Miyoshi', 'raw_affiliation_strings': ['Semiconductor Leading Edge Technologies, Inc. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Semiconductor Leading Edge Technologies, Inc. (Japan)', 'institution_ids': []}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5066465852', 'display_name': 'Takamitsu Furukawa', 'orcid': None}, 'institutions': [], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Takamitsu Furukawa', 'raw_affiliation_strings': ['Semiconductor Leading Edge Technologies, Inc. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Semiconductor Leading Edge Technologies, Inc. (Japan)', 'institution_ids': []}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5086379728', 'display_name': 'Toshiro Itani', 'orcid': None}, 'institutions': [], 'countries': ['JP'], 'is_corresponding': False, 'raw_author_name': 'Toshiro Itani', 'raw_affiliation_strings': ['Semiconductor Leading Edge Technologies, Inc. (Japan)'], 'affiliations': [{'raw_affiliation_string': 'Semiconductor Leading Edge Technologies, Inc. (Japan)', 'institution_ids': []}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.0, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 0, 'citation_normalized_percentile': {'value': 0.0, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 0, 'max': 57}, 'biblio': {'volume': '4689', 'issue': None, 'first_page': '646', 'last_page': '646'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11301', 'display_name': 'Advanced Surface Polishing Techniques', 'score': 0.9959, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T12224', 'display_name': 'Nanofabrication and Lithography Techniques', 'score': 0.9937, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/photoresist', 'display_name': 'Photoresist', 'score': 0.59360766}], 'concepts': [{'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.9936234}, {'id': 'https://openalex.org/C105487726', 'wikidata': 'https://www.wikidata.org/wiki/Q622938', 'display_name': 'Photolithography', 'level': 2, 'score': 0.8857082}, {'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.6929657}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.6912857}, {'id': 'https://openalex.org/C134406635', 'wikidata': 'https://www.wikidata.org/wiki/Q1439684', 'display_name': 'Photoresist', 'level': 3, 'score': 0.59360766}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.539247}, {'id': 'https://openalex.org/C6556556', 'wikidata': 'https://www.wikidata.org/wiki/Q899239', 'display_name': 'Contact angle', 'level': 2, 'score': 0.48209265}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.41229698}, {'id': 'https://openalex.org/C159985019', 'wikidata': 'https://www.wikidata.org/wiki/Q181790', 'display_name': 'Composite material', 'level': 1, 'score': 0.13801983}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1117/12.473505', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S183492911', 'display_name': 'Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE', 'issn_l': '0277-786X', 'issn': ['0277-786X', '1996-756X'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [{'id': 'https://metadata.un.org/sdg/6', 'display_name': 'Clean water and sanitation', 'score': 0.65}], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W4226294346', 'https://openalex.org/W2920584510', 'https://openalex.org/W2376266960', 'https://openalex.org/W2321285900', 'https://openalex.org/W2178933900', 'https://openalex.org/W2051685665', 'https://openalex.org/W2045098484', 'https://openalex.org/W2044269754', 'https://openalex.org/W1999595755', 'https://openalex.org/W1990950348'], 'abstract_inverted_index': {'Reducing': [0], 'defects': [1, 14, 80, 135, 169], 'in': [2, 106, 219], 'the': [3, 32, 37, 53, 57, 61, 68, 76, 109, 134, 183, 194, 201, 212, 215], 'semiconductor': [4], 'photolithography': [5], 'process': [6], 'has': [7, 40], 'become': [8], 'increasingly': [9], 'critical.': [10], 'Many': [11], 'kinds': [12, 139], 'of': [13, 60, 78, 98, 127, 140, 188], 'can': [15], 'occur': [16, 28, 218], 'during': [17, 29], 'photolithography,': [18], 'such': [19], 'as': [20, 145], 'missing': [21, 189], 'contact': [22, 190, 195], 'holes': [23, 191], 'or': [24], 'pattern': [25, 33], 'collapses': [26], 'that': [27, 90, 214], 'developing.': [30], 'As': [31], 'size': [34], 'becomes': [35], 'finer,': [36], 'exposure': [38], 'wavelength': [39], 'been': [41], 'shortened': [42], 'from': [43, 71], '248-nm': [44, 74, 147, 166], 'to': [45, 49, 73, 82, 153, 180, 197, 209], '193-nm,': [46], 'and': [47, 56, 101, 103, 118, 177], 'then': [48], '157-nm.': [50], 'In': [51], 'addition,': [52], 'resin': [54], 'structure': [55], 'chemical': [58], 'characteristics': [59], 'resist': [62, 69, 110, 184, 203], 'material': [63, 70, 111], 'have': [64, 88], 'changed': [65], 'greatly.': [66], 'Changing': [67], 'I-line': [72], 'created': [75], 'problem': [77], 'satellite': [79, 92], 'peculiar': [81, 152], 'chemically': [83], 'amplified': [84], 'resist.': [85, 143, 167, 221], 'Previous': [86], 'studies': [87], 'suggested': [89], 'a': [91, 95, 149], 'defect': [93, 125, 151, 217], 'is': [94, 104, 115, 119, 207], 'complex': [96], 'salt': [97], 'PAG,': [99], 'quencher,': [100], 'TMAH,': [102], 'soluble': [105], 'water.1)': [107], 'Because': [108], 'for': [112, 121], '157-nm': [113, 141, 157, 172, 202, 220], 'lithography': [114, 142], 'highly': [116], 'hydrophobic': [117], 'used': [120], 'making': [122], 'ultra-thin': [123], 'films,': [124], 'evaluations': [126], 'it': [128, 160], 'are': [129], 'necessary.': [130], 'This': [131], 'paper': [132], 'evaluates': [133], 'arising': [136], 'with': [137, 146, 156, 165, 171], 'various': [138], 'Just': [144], 'resist,': [148, 158, 173], 'deposition': [150], 'CAR': [154], 'occurs': [155, 161], 'but': [159, 174], 'more': [162], 'frequently': [163], 'than': [164], 'Unique': [168], 'appear': [170], 'their': [175], 'appearance': [176], 'frequency': [178], 'seem': [179], 'depend': [181], 'on': [182, 200, 211], 'structure.': [185], 'The': [186], 'number': [187], 'increases': [192], 'when': [193], 'angle': [196], 'ultra-pure': [198], 'water': [199], 'film': [204], 'raise.': [205], 'It': [206], 'necessary': [208], 'elucidate': [210], 'mechanism': [213], 'unique': [216]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W1980323190', 'counts_by_year': [], 'updated_date': '2024-12-06T23:14:16.152473', 'created_date': '2016-06-24'}