Title: Development of ion sources for materials processing in china
Abstract: This article reviews the development of ion sources for materials processing and the progress of commercial product of ion sources in China. The various ion-beam processing and the relative needs to ion sources are mentioned and discussed, such as ion sources with ion implantation, plasma immersion ion implantation, ion-beam-assisted deposition, ion-beam deposition, and so on. The states of progress for different kinds of ion sources specially for electron cyclotron resonance∕microwave, metal vapor vacuum arc, radio frequency (rf) ion source, end-Hall ion source, and cluster ion source, are given and discussed.
Publication Year: 2006
Publication Date: 2006-03-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 2
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