Title: Measurement of contact resistance of an ohmic contact applied to a high resistivity photoconductor
Abstract: A technique is described to estimate the contact resistance of an ohmic contact, under dynamic conditions, applied to a high resistivity photoconductor. It has been used to estimate the contact resistance of an ohmic contact (Au–Ge) applied to a semiinsulating Cr-doped GaAs (p≊108 W cm).
Publication Year: 1981
Publication Date: 1981-04-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 8
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