Title: Sol-gel derived antireflective coatings for silicon
Abstract: TiO2-SiO2 films containing from 30 to 95 mol% TiO2 were prepared by a sol-gel process. These films were applied to polished silicon and heat treated at temperatures less than 450°C to convert the applied films to amorphous oxide films ranging in refractive index from approximately 1.63 to 2.17. The films were evaluated for antireflectance as a function of conversion temperature. It was found that the sol-gel films applied at 400°C showed broad regions of antireflectance compared to other titanium-based films.
Publication Year: 1981
Publication Date: 1981-08-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 163
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