Title: Critical point lowering in thin PdH<sub>x</sub>films
Abstract:Pressure-composition isotherms of PdHx films of 100-400 nm thickness have been measured between 300 and 500K at pressures up to 10 bar by means of an oscillating quartz microbalance. For all the films...Pressure-composition isotherms of PdHx films of 100-400 nm thickness have been measured between 300 and 500K at pressures up to 10 bar by means of an oscillating quartz microbalance. For all the films investigated the two-phase region is considerably narrower than that of bulk PdHx. This narrowing of the miscibility gap, together with the observed lowering of the critical temperature, is due to a weakening of the hydrogen-hydrogen interaction which probably originates from the elastic boundary conditions at the film-substrate interface.Read More
Publication Year: 1983
Publication Date: 1983-02-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 65
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