Title: Auger electron spectroscopy and Rutherford backscattering spectroscopy studies of TiN and TiC coatings prepared by the activated reactive evaporation process
Abstract: TiNx and TiCx films were deposited by the activated reactive evaporation process under different process conditions. The films were studied by Auger electron spectroscopy and Rutherford backscattering spectroscopy (RBS); standards were used for both techniques. The RBS techniques showed low sensitivity to carbon and nitrogen when 1.8 MeV He+ ions were used. The sensitivity was enhanced by using 1.5 MeV H+ ions, but the resulting non-Rutherford scattering necessitated the use of standards although RBS is potentially a standardless method. A correlation was found between the chemical composition of TiNx and TiCx films and the partial pressures of N2 and C2H2 respectively.
Publication Year: 1987
Publication Date: 1987-10-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 13
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